nanoimprint lithography (rus. литография, нанопечатная) — technology designed for transferring images of electronic circuits or nanostructures onto a coated substrate, which includes coating deformation by stamping, following etching of the deformed surface and formation of nanostructures or elements of electronic circuits on the substrate.


In nanoimprint lithography an image is formed by mechanical deformation of the polymer coating (resist) by a mould (stamp), and not by changing the chemical structure of the coating by irradiation, as in lithography with exposure. Exclusion of resist irradiation through a mask from the process simplifies production. Nanoimprint lithography makes it possible to obtain nanostructures smaller than 10 nm over large areas, which is impossible in all other methods of lithography.


Nanoimprint lithography process (resist residue on imprinted sec
Nanoimprint lithography process (resist residue on imprinted sections is subject to anisotropic etching): (1) substrate, (2) resist, (3) stamp.


  • Gusev Alexander I.


  1. Gusev A. I. Nanomaterials, Nanostructures, and Nanotechnologies (in Russian) // Fizmatlit, Moscow (2007) - 416 pp.
  2. N. Kobajasi Introduction to nanotechnology. — Moscow: Binom, 2007.—134 pp.

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