metalorganic chemical vapour deposition abbr., MOCVD (rus. химическое осаждение из паров металлорганических соединений) — a variation of chemical vapour deposition method where volatile metal organic compounds are used as precursors.

Authors

  • Zhuravleva Natalya G.
  • Shlyakhtin Oleg A.

Related terms

Sections


Contact us

Rusnano Group uses cookies to improve the usability of the site.

If you do not want to use cookies, change your browser settings. By continuing to use the site of RUSNANO JSC you agree to the terms of the User agreement and Consent to the processing of your personal data.